Citation

BibTex format

@article{Georgiev:2014:10.1016/j.mee.2013.12.031,
author = {Georgiev, YM and Petkov, N and McCarthy, B and Yu, R and Djara, V and O'Connell, D and Lotty, O and Nightingale, AM and Thamsumet, N and deMello, JC and Blake, A and Das, S and Holmes, JD},
doi = {10.1016/j.mee.2013.12.031},
journal = {MICROELECTRONIC ENGINEERING},
pages = {47--53},
title = {Fully CMOS-compatible top-down fabrication of sub-50 nm silicon nanowire sensing devices},
url = {http://dx.doi.org/10.1016/j.mee.2013.12.031},
volume = {118},
year = {2014}
}

RIS format (EndNote, RefMan)

TY  - JOUR
AU - Georgiev,YM
AU - Petkov,N
AU - McCarthy,B
AU - Yu,R
AU - Djara,V
AU - O'Connell,D
AU - Lotty,O
AU - Nightingale,AM
AU - Thamsumet,N
AU - deMello,JC
AU - Blake,A
AU - Das,S
AU - Holmes,JD
DO - 10.1016/j.mee.2013.12.031
EP - 53
PY - 2014///
SN - 0167-9317
SP - 47
TI - Fully CMOS-compatible top-down fabrication of sub-50 nm silicon nanowire sensing devices
T2 - MICROELECTRONIC ENGINEERING
UR - http://dx.doi.org/10.1016/j.mee.2013.12.031
UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000335431000010&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=1ba7043ffcc86c417c072aa74d649202
VL - 118
ER -