The Combined Magnetron Sputtering and Electron Beam Deposition System is an ultra-high vacuum sputtering and evaporation system.

It consists of three sources for DC and RF magne-tron sputtering and four-pocket e-beam evaporator. It has two types substrate holders: one is with active cooling system; while the second is with a heating stage to 800°C and RF biasing option. Both substrate holders can handle wafers up to 4” in diameter.

The Combined Magnetron Sputtering and Electron Beam Deposition System
The Combined Magnetron Sputtering and Electron Beam Deposition System

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Combined Mantis Magnetron Sputtering and E-Beam Deposition System help and support

  • Dr Peter Petrov

    Dr Peter Petrov, Department of Materials, Imperial College London

    Personal details

    Dr Peter Petrov Principal Research Scientist Thin Film Laboratory

    +44 (0)20 7594 8156

    Support with

    General enquiries, users registrations and academic research in Thin Film Technology

    Location

    Department of Materials
    Bessemer Building (though the TYC/ LCN corridor)
    Ground Floor, B333