This is a combined system that consists of a Physical Vapour Deposition (PVD) (thermal evapora-tion) chamber which is used for the deposition of copper thin films, and a vertical Chemical Va-pour Deposition (CVD) system used for graphene deposition. Both chambers are connected with a common load-lock that allows the deposition of high-quality graphene on 4” Si wafers. A copper thin film is deposited on a 4” wafer which is then transferred (without breaking the vacuum) to the CVD reactor for consequent graphene growth.

The CVD reactor benefits also from a RF plasma source to pre-crack the reacting gas molecules.

VG Scienta Nanoedge 100, combined PVD & CVD Graphene deposition system: photo (left) schematic diagram of the CVD reactor (right)
VG Scienta Nanoedge 100, combined PVD & CVD Graphene deposition system: photo (left) schematic diagram of the CVD reactor (right)

VG Scienta Nanoedge 100, Combined PVD and CVD Graphene Deposition System help and support

  • Dr Peter Petrov

    Dr Peter Petrov, Department of Materials, Imperial College London

    Personal details

    Dr Peter Petrov Principal Research Scientist Thin Film Laboratory

    +44 (0)20 7594 8156

    Support with

    General enquiries, users registrations and academic research in Thin Film Technology

    Location

    Department of Materials
    Bessemer Building (though the TYC/ LCN corridor)
    Ground Floor, B333