VG Scienta Nanoedge 100, Combined PVD and CVD Graphene Deposition System
This is a combined system that consists of a Physical Vapour Deposition (PVD) (thermal evapora-tion) chamber which is used for the deposition of copper thin films, and a vertical Chemical Va-pour Deposition (CVD) system used for graphene deposition. Both chambers are connected with a common load-lock that allows the deposition of high-quality graphene on 4” Si wafers. A copper thin film is deposited on a 4” wafer which is then transferred (without breaking the vacuum) to the CVD reactor for consequent graphene growth.
The CVD reactor benefits also from a RF plasma source to pre-crack the reacting gas molecules.
VG Scienta Nanoedge 100, Combined PVD and CVD Graphene Deposition System help and support
Dr Peter Petrov
Personal detailsDr Peter Petrov Principal Research Scientist Thin Film Laboratory
Send email+44 (0)20 7594 8156
General enquiries, users registrations and academic research in Thin Film Technology
Department of Materials
Bessemer Building (though the TYC/ LCN corridor)
Ground Floor, B333