Pulsed Laser Deposition (PLD) is a physical vapour deposition technique used to produce thin films of complex materials over a wide range of background gas compositions or pressures.

Our PLD system consists of four fully-automated deposition chambers, each equipped with a six-position target carrousel that allows deposition of multilayer structures formed of up to six different materials. There is a deposition chambers with diode substrate heater that allows deposition at temperatures up to 1200°C. Layer-by-layer growth of functional materials, controlled by a kSA 400 RHEED system is also available in our specialised UHV deposition chamber.

PLD System with four deposition chamber

Neocera images

Neocera Pulsed Laser Deposition System help and support

  • Professor Neil Alford MBE FREng

    Professor Neil Alford MBE FREng, Department of Materials, Imperial College London

    Personal details

    Professor Neil Alford MBE FREng Academic Lead

    +44 (0)20 7594 6724

    Support with

    Academic research in Thin Film Technology

    Location

    Department of Materials
    Royal School of Mines
    Second Floor, 2.05

  • Dr Peter Petrov

    Dr Peter Petrov, Department of Materials, Imperial College London

    Personal details

    Dr Peter Petrov Principal Research Scientist, Departmental Safety Officer, Laser Safety Advisor

    +44 (0)20 7594 8156

    Support with

    THIN FILM TECHNOLOGY

    General enquiries
    Users registrations
    Academic research

    Location

    Department of Materials
    Bessemer Building (through the LCN/ TYC Corridor)
    Ground Floor, B333