The Mantis Oxides E-Beam Epitaxy Deposition System is an electron beam physical vapour deposition system used for the deposition of oxide thin films. It employs three high-power e-beam molecular sources and an oxygen RF plasma source.

It has a typical base pressure of 10-9 torr and operates within the temperature range from room temperature to 1000°C. It is equipped with RGA and RHEED systems for precise thin film growth control. It has a heated load-lock with 20x, 4” wafer storage facility.

Mantis Oxides E-Beam Epitaxy Deposition System
Mantis Oxides E-Beam Epitaxy Deposition System

Mantis Oxides E-Beam Epitaxy Deposition System help and suport

  • Dr Peter Petrov

    Dr Peter Petrov, Department of Materials, Imperial College London

    Personal details

    Dr Peter Petrov Principal Research Scientist Thin Film Laboratory

    +44 (0)20 7594 8156

    Support with

    General enquiries, users registrations and academic research in Thin Film Technology

    Location

    Department of Materials
    Bessemer Building (though the TYC/ LCN corridor)
    Ground Floor, B333