Imperial College London
Alternate

Dr Alexander Wray

Faculty of Engineering, Department of Chemical Engineering

Academic Visitor
 
 
 
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Contact

 

alex.wray09 Website

 
 
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Location

 

432MBone BuildingSouth Kensington Campus

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Summary

 

Publications

Citation

BibTex format

@article{Wray:2015:10.1016/j.piutam.2015.04.024,
author = {Wray, AW and Matar, OK and Craster and Sefiane, K and Papageorgiou, DT},
doi = {10.1016/j.piutam.2015.04.024},
journal = {Procedia IUTAM},
pages = {172--177},
title = {Electrostatic Suppression of the "Coffee-stain Effect"},
url = {http://dx.doi.org/10.1016/j.piutam.2015.04.024},
volume = {15},
year = {2015}
}
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RIS format (EndNote, RefMan)

TY  - JOUR
AB  - The dynamics of a slender, nano-particle laden droplet are examined when it is subjected to an electric field. Under a long-waveassumption, the governing equations are reduced to a coupled pair of nonlinear evolution equations prescribing the dynamics of theinterface and the depth-averaged particle concentration. This incorporates the effects of viscous stress, capillarity, electrostaticallyinducedMaxwell stress, van der Waals forces, evaporation and concentration-dependent rheology. It has previously been shown27that electric fields can be used to suppress the ring effect typically exhibited when such a droplet undergoes evaporation. Wedemonstrate here that the use of electric fields affords many diverse ways of controlling the droplets.
AU  - Wray,AW
AU  - Matar,OK
AU  - Craster
AU  - Sefiane,K
AU  - Papageorgiou,DT
DO  - 10.1016/j.piutam.2015.04.024
EP  - 177
PY  - 2015///
SN  - 2210-9838
SP  - 172
TI  - Electrostatic Suppression of the "Coffee-stain Effect"
T2  - Procedia IUTAM
UR  - http://dx.doi.org/10.1016/j.piutam.2015.04.024
UR  - http://hdl.handle.net/10044/1/28424
VL  - 15
ER  -
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