Imperial College London
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ProfessorKristelFobelets

Faculty of Engineering, Department of Electrical and Electronic Engineering

Professor of Nanodevices
 
 
 
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Contact

 

+44 (0)20 7594 6236k.fobelets Website CV

 
 
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Assistant

 

Ms Susan Brace +44 (0)20 7594 6215

 
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Location

 

714Electrical EngineeringSouth Kensington Campus

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Summary

 

Publications

Citation

BibTex format

@article{Yeoh:1998:12/020,
author = {Yeoh, JC and Green, PW and Thornton, TJ and Kaya, S and Fobelets, K and Fernández, JM},
doi = {12/020},
journal = {SEMICONDUCTOR SCIENCE AND TECHNOLOGY},
pages = {1442--1445},
title = {MOS gated Si:SiGe quantum wells formed by anodic oxidation},
url = {http://dx.doi.org/10.1088/0268-1242/13/12/020},
volume = {13},
year = {1998}
}
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RIS format (EndNote, RefMan)

TY  - JOUR
AU  - Yeoh,JC
AU  - Green,PW
AU  - Thornton,TJ
AU  - Kaya,S
AU  - Fobelets,K
AU  - Fernández,JM
DO  - 12/020
EP  - 1445
PY  - 1998///
SN  - 0268-1242
SP  - 1442
TI  - MOS gated Si:SiGe quantum wells formed by anodic oxidation
T2  - SEMICONDUCTOR SCIENCE AND TECHNOLOGY
UR  - http://dx.doi.org/10.1088/0268-1242/13/12/020
UR  - https://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000077369000017&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=a2bf6146997ec60c407a63945d4e92bb
VL  - 13
ER  -
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