Citation

BibTex format

@article{Guilbert:2016:10.1039/c6sm01183g,
author = {Guilbert, AAY and Cabral, JT},
doi = {10.1039/c6sm01183g},
journal = {Soft Matter},
pages = {827--835},
title = {Impact of solution phase behaviour and external fields on thin film morphology: PCBM and RRa-P3HT model system},
url = {http://dx.doi.org/10.1039/c6sm01183g},
volume = {13},
year = {2016}
}

RIS format (EndNote, RefMan)

TY  - JOUR
AB - We report the impact of the ternary solution phase behaviour on the film morphology and crystallization of a model polymer:fullerene system. We employ UV-Vis absorption spectroscopy, combined with sequential filtration and dilution, to establish the phase diagram for regio-random poly(3-hexylthiophene-2,5-diyl) and phenyl-C61-butyric acid methyl ester (PCBM) in chlorobenzene. Films are systematically cast from one- and two-phase regions decoupling homogeneous and heterogenous nucleation, and the role of pre-formed aggregates from solutions. Increasing annealing temperature from 120 to 200 °C reveals a highly non-monotonic nucleation profile with a maximum at 170 °C, while the crystal growth rate increases monotonically. UV ozonolysis is employed to vary substrate energy, and found to increase nucleation rate and to promote a binary crystallization process. As previously found, exposure to light, under an inert atmosphere, effectively suppresses homogeneous nucleation; however, it has a considerably smaller effect on heterogeneous nucleation, either from solution aggregates or substrate-driven. Our results establish a quantitative link between solution thermodynamics, crystallization and provide insight into morphological design based on processing parameters in a proxy organic photovoltaic system.
AU - Guilbert,AAY
AU - Cabral,JT
DO - 10.1039/c6sm01183g
EP - 835
PY - 2016///
SN - 1744-683X
SP - 827
TI - Impact of solution phase behaviour and external fields on thin film morphology: PCBM and RRa-P3HT model system
T2 - Soft Matter
UR - http://dx.doi.org/10.1039/c6sm01183g
UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000395372100014&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=1ba7043ffcc86c417c072aa74d649202
UR - http://hdl.handle.net/10044/1/49928
VL - 13
ER -