Facilities
3D Printer
Robocaster 3D printer capable to printing down to μm-resolution. Temperature controllable with 3 print heads for multiple simultaneous printing patterns. Printing can be done on arbitrary substrates.
Electrical Probe Station
Janis Probe station equipped with a temperature sensitive stage suitable for measuring the electrical properties of materials.
High Speed Centrifuge
High speed Sorvall Lynx 6000 centrifuge.
Glove Box
PureLab He GP-1 Nitrogen glove box for synthesis & processing of 2D materials.
Electrochemical Facilities
Gamry potentiostats capable of performing a wide array of electrochemical measurements, including cyclic voltammetry, linear sweep voltammetry, chonoamperometry, and electrochemical impedence spectroscopy.
Chemical Vapor Deposition (CVD) Station
Horizontal CVD system works in a temperature range from 200-1050 °C, the flowrate of the carrier gas is monitored and regulated by the mass flow controller.
Metal-Organic Chemical Vapor Deposition (MOCVD) Station
Customized MOCVD station includes the auto-control system, gas delivery system, energy system, and vacuum system. The volatile metal-organic precursors are sealed in stainless steel bubblers. The pressure and flow rate of vaporized precursors are separately controlled by the mass flow controllers and pressure monitors.
Schlenk line
A standard Schlenk line used for solution-phase synthesis of the air- and moisture-sensitive materials