Advanced Photoelectron Spectroscopy Laboratory (APSL)
A cutting edge laboratory for photoelectron spectroscopy from ultra-high vacuum to 10 mbar
X-ray photoelectron spectroscopy (XPS) and ultra-violet photoelectron spectroscopy (UPS) are fundamental techniques in the analysis of the surfaces of materials providing key information on their elemental composition, surface chemistry and electronic properties.
The APSL is equipped with two state-of-the-art spectrometers, one providing high-throughput UHV XPS capability, and the other capable of providing measurement flexibility between near-ambient pressure and UHV conditions for both XPS and UPS measurements.
Dr Gwilherm Kerherve - Advanced Photoelectron Spectroscopy Facilities
The systems
High-throughput X-ray Photoelectron Spectrometer – Thermo Fisher K-Alpha+
A fully integrated, high-throughput, monochromated small-spot XPS system with depth profiling capabilities.
| Analyser Type | 180° double focussing hemispherical analyser-128-channel detector |
| Kinetic energy range (analyser) | 100 - 4000 eV |
| X-ray source | Monochromated Al Ka Micro-focused |
| Depth Profiling | EX06 Ion Source |
| X-Ray Source Type | Monochromated, Micro-focused Al K-a |
| X-Ray Spot Size | 30 - 400 µm in 5 µm steps |
| Optional Accessories holder | Angle-resolved XPS Sample Holder, Work Function Sample Holder, Glove Box sample transfer |
| Sample Preparation Options | None |
| Sampling Area | 60x60 mm |
| Max. thickness sample | 20 mm |
| Vacuum System | 2x260 l/s turbo molecular pumps for entry and analysis chambers, Auto-firing, 3 filament TSP |
High-pressure X-ray photoelectron spectroscopy – Scienta Omicron
A world-leading instrument consisting of both monochromated X-ray and UV sources and a hemispherical electron energy analyser capable of operating from UHV up to 25 mbar, dosing a variety of gases/gas mixtures.
| Analyser Type | 180° double focussing hemispherical analyser-128-channel detector |
| Kinetic energy range (analyser) | 5 – 10,000 eV (transmission), 10-10,000 eV (angular) |
| X-Ray source | Monochromated Al Ka (MX650) consisting of XM-780 X-ray monochromator and SAX-100 X-ray source |
| UV source | VUV5000 photon source and VUV5047 UV-monochromator |
| Pass energy | 5-500 eV |
| Sample preparation | Preparation chamber 1: Argon sputter, electron beam annealing (up to 1000 oC) and LEED optics |
| Preparation chamber 2 | Argon sputter, electron beam annealing up to 1000 oC, RF oxygen plasma source, spare ports for additional deposition sources and a vacuum suitcase |
| Vacuum system | 13 Edwards nXDS scroll pumps, 12 Pfeifer/Leybold turbo pumps, 3 CapaciTorr getter pumps |
| Pressure | Better then 2×10-10 mbar (UHV) up to 50 mbar (verified for N2) |
| Gases | Air, N2, O2, H2, H2O, CO2, CO + more |
| Sample temperature | -140 to 1000 ˚C (at pressure) |
For further information of the high-pressure XPS instrument and capability please read the following publication:
Laboratory-based high pressure X-ray photoelectron spectroscopy: A novel and flexible reaction cell approach
G. Kerherve et al. Review of Scientific Instruments, 88, 033102 (2017)
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Dr Gwilherm Kerherve
Personal details
Dr Gwilherm Kerherve Research Facility Manager (Advanced Photoelectron Spectroscopy Laboratory (APSL) High Throughput XPS)Location
Department of Materials
Royal School of Mines