This is a physical etching technique used to pattern thin film layers. Ions of inert gas (e.g. Ar) with controlled en-ergy are extracted from RF generated plasma to form a wide beam. The ion beam is further accelerated and neutralised before interacting with the sample, which is anchored on a water-cooled holder with rotation and tilt-ing abilities.

The ion milling system enables the top-down fabrication of devices and patterned structures. In conjunction with various lithography techniques available in the lab, the ion miller allows a range of materials to be patterned on a micro- and nano-scale.

OAR IM150 Ion Milling System
OAR IM150 Ion Milling System

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OAR IM 150 Ion Milling System help and support

  • Dr Peter Petrov

    Dr Peter Petrov, Department of Materials, Imperial College London

    Personal details

    Dr Peter Petrov Principal Research Scientist Thin Film Laboratory

    +44 (0)20 7594 8156

    Support with

    General enquiries, users registrations and academic research in Thin Film Technology


    Department of Materials
    Bessemer Building (though the TYC/ LCN corridor)
    Ground Floor, B333