Mantis Oxides E-Beam Epitaxy Deposition System
The Mantis Oxides E-Beam Epitaxy Deposition System is an electron beam physical vapour deposition system used for the deposition of oxide thin films. It employs three high-power e-beam molecular sources and an oxygen RF plasma source.
It has a typical base pressure of 10-9 torr and operates within the temperature range from room temperature to 1000°C. It is equipped with RGA and RHEED systems for precise thin film growth control. It has a heated load-lock with 20x, 4” wafer storage facility.
Mantis Oxides E-Beam Epitaxy Deposition System help and suport
Dr Peter Petrov
Personal detailsDr Peter Petrov Principal Research Scientist Thin Film Laboratory
Send email+44 (0)20 7594 8156
General enquiries, users registrations and academic research in Thin Film Technology
Department of Materials
Bessemer Building (though the TYC/ LCN corridor)
Ground Floor, B333