BibTex format
@inproceedings{Paul:2005:10.1016/j.mssp.2004.09.106,
author = {Paul, DJ and Temple, M and Olsen, SH and ONeill, AG and Tang, YT and Waite, AM and Cerrina, C and Evans, AGR and Li, X and Zhang, J and Norris, DJ and Cullis, AG},
doi = {10.1016/j.mssp.2004.09.106},
pages = {343--346},
publisher = {ELSEVIER SCI LTD},
title = {Strained-Si n-MOS surface-channel and buried Si<sub>0.7</sub>Ge<sub>0.3</sub> compressively- strained p-MOS fabricated in a 0.25 μm heterostructure CMOS process},
url = {http://dx.doi.org/10.1016/j.mssp.2004.09.106},
year = {2005}
}