Imperial College London

Professor Omar K. Matar

Faculty of EngineeringDepartment of Chemical Engineering

Vice-Dean (Education), Faculty of Engineering
 
 
 
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Contact

 

+44 (0)20 7594 9618o.matar Website

 
 
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Assistant

 

Miss Nazma Mojid +44 (0)20 7594 3918

 
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Location

 

506ACE ExtensionSouth Kensington Campus

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Summary

 

Publications

Citation

BibTex format

@article{Nania:2017:10.1039/c6nr08255f,
author = {Nania, M and Foglia, F and Matar, OK and Cabral, JT},
doi = {10.1039/c6nr08255f},
journal = {Nanoscale},
pages = {2030--2037},
title = {Sub-100 nm wrinkling of polydimethylsiloxane by double frontal oxidation},
url = {http://dx.doi.org/10.1039/c6nr08255f},
volume = {9},
year = {2017}
}

RIS format (EndNote, RefMan)

TY  - JOUR
AB - We demonstrate nanoscale wrinkling on polydimethylsiloxane (PDMS) at sub-100 nm length scales via a(double) frontal surface oxidation coupled with a mechanical compression. The kinetics of the glassy skinpropagation is resolved by neutron and X-ray reflectivity, and atomic force microscopy, combined withmechanical wrinkling experiments to evaluate the resulting pattern formation. In conventional PDMSsurface oxidation, the smallest wrinkling patterns attainable have an intrinsic lower wavelength limit dueto the coupling of skin formation and front propagation at fixed strain εprestrain, whose maximum is, inturn, set by material failure. However, combining two different oxidative processes, ultra-violet ozonolysisfollowed by air plasma exposure, we break this limit by fabricating trilayer laminates with excellent interfacialproperties and a sequence of moduli and layer thicknesses able to trivially reduce the surface topographyto sub-100 nm dimensions. This method provides a powerful, yet simple, non-lithographicapproach to extend surface patterning from visible to the deep UV range.
AU - Nania,M
AU - Foglia,F
AU - Matar,OK
AU - Cabral,JT
DO - 10.1039/c6nr08255f
EP - 2037
PY - 2017///
SN - 2040-3364
SP - 2030
TI - Sub-100 nm wrinkling of polydimethylsiloxane by double frontal oxidation
T2 - Nanoscale
UR - http://dx.doi.org/10.1039/c6nr08255f
UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000395594300034&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=1ba7043ffcc86c417c072aa74d649202
UR - http://hdl.handle.net/10044/1/49357
VL - 9
ER -