Publications
105 results found
Eslava S, Baklanov MR, Kirschhock CEA, et al., 2007, Characterization of a molecular sieve coating using ellipsometric porosimetry, LANGMUIR, Vol: 23, Pages: 12811-12816, ISSN: 0743-7463
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- Citations: 39
Eslava S, Iacopi F, Baklanov MR, et al., 2007, Ultraviolet-assisted curing of polycrystalline pure-silica zeolites: Hydrophobization, functionalization, and cross-linking of grains, JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, Vol: 129, Pages: 9288-+, ISSN: 0002-7863
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- Citations: 35
Eslava S, Eymery G, Foubert P, et al., 2007, Optical characteristics of low-k films and barrier layers in the ultraviolet range, 4th International Conference on Spectroscopic Ellipsometry
3. S. Eslava, G. Eymery, P. Foubert, F. Iacopi, K. Maex, M.R. Baklanov; ;
Eslava S, Eymery G, Foubert P, et al., 2007, Optical absorption and characteristics of low-k films and barrier layers in the UV range, Mater. Res. Soc. Spring 2007
Eslava S, Iacopi F, Baklanov MR, et al., 2007, Ultra-violet-assisted cure of spin-on silicalite-1 films, 15th International Zeolite Conference 2007, Pages: 594-599, ISSN: 0167-2991
Eslava S, Iacopi F, Baklanov MR, et al., 2007, Ultra-violet-assisted cure of spin-on silicalite-1 films, 15th International Zeolite Conference 2007, Pages: 594-599, ISSN: 0167-2991
Iacopi F, Eslava S, Kirschhock CEA, et al., 2007, UV light exposure for functionalization and hydrophobization of pure silica zeolite, USA (US2007/0189961), Europe (EP1816104) and Japan (JP2007210884).
Shamiryan D, Paraschiv V, Eslava-Fernandez S, et al., 2007, Profile control of novel non-Si gates using BCl3/N2 plasma, J. Vacuum Sci. Technol. B, Vol: 25
The authors found that a BCl3/N2 plasma is very suitable for metal gate patterning and profile control as it produces a passivating film during the etching. On blanket wafers, a boron-nitride-like film is deposited from a boron trichloride/nitride plasma mixture in a standard etch chamber at temperatures as low as 60 °C. Deposition rate can be varied from 10 to more than 100 nm/min depending on the plasma conditions and BCl3/N2 ratio. The film contains hexagonal boron nitride but is very unlikely to be a stoichiometric BN. It decomposes at elevated temperatures and is water soluble. The latter property makes the postetch clean relatively straightforward. This film can be used for sidewall passivation during the patterning of advanced non-Si gates, e.g., metal gates. They are presenting the use of BCl3/N2 plasma for patterning of Ge and TaN gates as examples. The Ge gate profile is damaged by a pure BCl3 plasma during high-k dielectric (HfO2) etching after the gate patterning. Addition of 10% N2 to the BCl3 plasma preserves the gate profile while removing the high k. In the other example, a TaN gate is etched isotopically by pure BCl3 plasma. Addition of 5% N2 prevents the lateral attack providing straight TaN profile.
Eslava S, Baklanov MR, Iacopi F, et al., 2006, Porosity study on MFI zeolite films, TRI/Princeton Workshop on Characterization of Porous Materials 2006
Shamiryan D, Paraschiv V, Eslava-Fernandez S, et al., 2006, BCl3/N-2 plasma for advanced non-Si gate patterning, Mater. Res. Soc. Spring 2006, Pages: 105-110, ISSN: 0272-9172
Eslava-Fernandez S, Baklanov MR, Iacopi F, et al., 2006, Zeolite low-k film properties dependence on nanocrystal size, Mater. Res. Soc. Spring 2006, Pages: 421-426, ISSN: 0272-9172
Eslava S, Baklanov MR, Iacopi F, et al., 2006, Zeolite low-k film properties dependence on crystal size, Mater. Res. Soc. Spring 2006
Mater. Res. Soc. Spring 2006, San Francisco, US. Proceedings published in Mater. Res. Soc. Symp. Proc. 2006, 914, F03.
Shamiryan D, Paraschiv V, Eslava S, et al., 2006, BCl3/N2 plasma for advanced non-Si gate patterning, Mater. Res. Soc. Spring 2006
Iacopi F, Beyer G, Houthoofd P, et al., 2006, Matrix structure of organo-silicate glasses and thermo-mechanical properties of thin low-k films, Mater. Res. Soc. Spring 2006
5. F. Iacopi, G. Beyer, K. Houthoofd, P. Adriaensens, C. Waldfried, S. Demuynck, Y. Travaly, S. Eslava Fernandez, D. Gage, S. Giangrandi, M. Rennau, K. Schulze, S. Schulz, G. Carlotti, R. Dauskardt; ;, Mater. Res. Soc. Spring 2006, San Francisco,US.
Armini S, Whelan CM, Smet M, et al., 2006, Size shrinkage of methacrylate-based terpolymer latexes synthesized by free radical polymerization: Kinetics and influence of main reaction parameters, POLYMER JOURNAL, Vol: 38, Pages: 786-798, ISSN: 0032-3896
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- Citations: 12
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