DrTomTate

Faculty of Engineering, Department of Electrical and Electronic Engineering

Cleanroom Facilities Manager

Contact

t.tate

Location

707aElectrical EngineeringSouth Kensington Campus

Summary

Publications

Citation

BibTex format

@inproceedings{Yuk:2003,
author = {Yuk, HS and Tate, T and Fobelets, K and Zhang, J and McPhail, DS and Chater, RJ},
pages = {15--16},
publisher = {IEEE},
title = {B - 1 "Fabrication technique of SiGe-on-Insulator (SGOI) substrates by Ge+ implantation for strained-Si SiGe hetero-structure-CMOS technologies"},
year = {2003}
}

Download

RIS format (EndNote, RefMan)

TY  - CPAPER
AU  - Yuk,HS
AU  - Tate,T
AU  - Fobelets,K
AU  - Zhang,J
AU  - McPhail,DS
AU  - Chater,RJ
EP  - 16
PB  - IEEE
PY  - 2003///
SP  - 15
TI  - B - 1 "Fabrication technique of SiGe-on-Insulator (SGOI) substrates by Ge+ implantation for strained-Si SiGe hetero-structure-CMOS technologies"
ER  -

Download