Imperial College London


Faculty of Natural SciencesDepartment of Physics

Visiting Professor



+44 (0)20 7594 6669thomas.anthopoulos Website




Mrs Carolyn Dale +44 (0)20 7594 7579




1111Blackett LaboratorySouth Kensington Campus






BibTex format

author = {Twyman, NM and Tetzner, K and Anthopoulos, TD and Payne, DJ and Regoutz, A},
doi = {10.1016/j.apsusc.2019.02.038},
journal = {Applied Surface Science},
pages = {974--979},
title = {Rapid photonic curing of solution-processed In <inf>2</inf> O <inf>3</inf> layers on flexible substrates},
url = {},
volume = {479},
year = {2019}

RIS format (EndNote, RefMan)

AB - © 2019 Elsevier B.V. In 2 O 3 is one of the most important semiconducting metal oxides primarily because of its wide band gap, high electron mobility and processing versatility. To this end, high-quality thin films of In 2 O 3 can be prepared using scalable and inexpensive solution-based deposition methods, hence making it attractive for application in a number of emerging electronic applications. However, traditional solution processing often requires high temperature and lengthy annealing steps, making it impossible to use in combination with temperature-sensitive plastic substrates, which would be desired for numerous emerging flexible device applications. Here, rapid photonic curing of In 2 O 3 layers is explored as an alternative to thermal annealing. Oxide thin films are successfully prepared on a range of substrates, including glass, polyimide, and polyethylene naphthalate. The effect of substrate and post-processing treatment on the morphology, surface chemistry, and electronic properties is investigated by atomic force microscopy and X-ray photoelectron spectroscopy. Systematic trends are identified, particularly in the degree of conversion of the precursor and its influence on the electronic structure.
AU - Twyman,NM
AU - Tetzner,K
AU - Anthopoulos,TD
AU - Payne,DJ
AU - Regoutz,A
DO - 10.1016/j.apsusc.2019.02.038
EP - 979
PY - 2019///
SN - 0169-4332
SP - 974
TI - Rapid photonic curing of solution-processed In <inf>2</inf> O <inf>3</inf> layers on flexible substrates
T2 - Applied Surface Science
UR -
UR -
VL - 479
ER -