Pulsed Laser Deposition (PLD) is a physical vapour deposition technique used to produce thin films of complex materials over a wide range of background gas compositions or pressures.

Our PLD system consists of four fully-automated deposition chambers, each equipped with a six-position target carrousel that allows deposition of multilayer structures formed of up to six different materials. There is a deposition chambers with diode substrate heater that allows deposition at temperatures up to 1200°C. Layer-by-layer growth of functional materials, controlled by a kSA 400 RHEED system is also available in our specialised UHV deposition chamber.

PLD System with four deposition chamber