Imperial College London
Dr Richard Chater

DrRichardChater

Faculty of Engineering, Department of Materials

Instrumentation Research Fellow, Surface Analysis
 
 
 
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Contact

 

+44 (0)20 7594 6740r.chater

 
 
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Location

 

LG62ARoyal School of MinesSouth Kensington Campus

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Summary

 

Publications

Citation

BibTex format

@article{Mehonic:2016:10.1002/adma.201670241,
author = {Mehonic, A and Buckwell, M and Montesi, L and Munde, MS and Gao, D and Hudziak, S and Chater, RJ and Fearn, S and McPhail, D and Bosman, M and Shluger, AL and Kenyon, AJ},
doi = {10.1002/adma.201670241},
journal = {Advanced Materials},
pages = {7549--7549},
title = {Silica: Nanoscale Transformations in Metastable, Amorphous, Silicon-Rich Silica (Adv. Mater. 34/2016)},
url = {http://dx.doi.org/10.1002/adma.201670241},
volume = {28},
year = {2016}
}
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RIS format (EndNote, RefMan)

TY  - JOUR
AB  - Electrically biasing thin films of amorphous, substoichiometric silicon oxide drives surprisingly large structural changes, apparent as density variations, oxygen movement, and ultimately, emission of superoxide ions. Results from this fundamental study are directly relevant to materials that are increasingly used in a range of technologies, and demonstrate a surprising level of field-driven local reordering of a random oxide network.
AU  - Mehonic,A
AU  - Buckwell,M
AU  - Montesi,L
AU  - Munde,MS
AU  - Gao,D
AU  - Hudziak,S
AU  - Chater,RJ
AU  - Fearn,S
AU  - McPhail,D
AU  - Bosman,M
AU  - Shluger,AL
AU  - Kenyon,AJ
DO  - 10.1002/adma.201670241
EP  - 7549
PY  - 2016///
SN  - 0935-9648
SP  - 7549
TI  - Silica: Nanoscale Transformations in Metastable, Amorphous, Silicon-Rich Silica (Adv. Mater. 34/2016)
T2  - Advanced Materials
UR  - http://dx.doi.org/10.1002/adma.201670241
UR  - http://hdl.handle.net/10044/1/40826
VL  - 28
ER  -
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