Nanostructured films prepared by liquid deposition
David Grosso
1 Laboratoire Chimie de la Matière Condensée de Paris, Group sol-gel chemistry and processing, UMR UPMC-CNRS 7574, Université Pierre et Marie Curie (Paris 6), Collège de France, 11, place Marcelin Berthelot, 75231 Paris. david.grosso@upmc.fr
Complex hierarchical nano structures can be achieved when combining chemical advanced bottom-up strategies, such as self-assembly and sol-gel chemistry, together with liquid solution processing, such as dip-coating. It will be demonstrated that dip-coating is an extremely versatile tool to prepare thin nanostructured and mesoporous metal oxide films from liquid solutions and that it has been used for many decades without taking advantage of its whole potentiality. Many types of oxide can be prepared and will thus be mentioned, but the present communication will focus mainly on SiO2 (from amorphous to epitaxial alpha-quartz), photoactive TiO2, and on other state-of-the-art nanostructured thin films. Their interests in optics, in microelectronic, in photovoltaic, in photocatalysis, in nano fluidics, or in nano construction will also be discussed. The usefulness of the ellipsometry analytical techniques in determining thin films optical properties, porosity characteristics, mechanical properties, photocatalytic activity, or thermal and chemical stabilities will also be presented all along the presentation. Finally, we will show that the described “bottom-up” approaches can be combined with conventional “top-down” technologies, such as reactive ions etching or optical and nano imprint lithography, to construct even more complex morphologies with multi scales features and motifs.
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