Location: Clean Room
Magnetron Sputtering (HIPIMS)
The Magnetron Sputtering System is an ultra-high vacuum deposition system.
It consists of three sources for DC and RF magnetron sputtering. It has a 4” in diameter rotating substrate holder with a heating stage to 800°C and RF biasing option. The system has High-Power Impulse Magnetron Sputtering (HiPIMS) deposition capability.
It is equipped with two Ionautics’ HiPSTER 1 power supplies with Reactive Sputtering control and a HiPSTER synchronisation unit that allows the user to control the pulsing of both HiPSTER HiPIMS power supplies.
E-Beam Deposition System
Location: Deposition Lab
****To be commissioned***
Pulsed Laser Deposition
Location: Laser Lab
Pulsed Laser Deposition (Chamber 3)
Pulsed Laser Deposition (PLD) is a physical vapour deposition technique used to produce thin films of complex materials over various background gas compositions or pressures. Our PLD system consists of four fully-automated deposition chambers, each equipped with a six-position target carrousel that allows the deposition of multilayer structures of up to six different materials.
There are two deposition chambers with a diode substrate heater that allows deposition at temperatures up to 1200°C. Layer-by-layer growth of functional materials, controlled by a kSA 400 RHEED system, is also available in our specialised UHV deposition chamber.