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Magnetron Sputtering

Location: Clean Room 

Magnetron Sputtering  (HIPIMS) 

The Magnetron Sputtering System is an ultra-high vacuum deposition system.   

It consists of three sources for DC and RF magnetron sputtering. It has a 4” in diameter rotating substrate holder with a heating stage to 800°C and RF biasing option. The system has High-Power Impulse Magnetron Sputtering (HiPIMS) deposition capability.

It is equipped with two Ionautics’ HiPSTER 1 power supplies with Reactive Sputtering control and a HiPSTER synchronisation unit that allows the user to control the pulsing of both HiPSTER HiPIMS power supplies.

E-Beam Deposition System

Location: Deposition Lab

****To be commissioned***



Pulsed Laser Deposition

Location: Laser Lab

Pulsed Laser Deposition (Chamber 3)

Pulsed Laser Deposition (PLD) is a physical vapour deposition technique used to produce thin films of complex materials over various background gas compositions or pressures.  Our PLD system consists of four fully-automated deposition chambers, each equipped with a six-position target carrousel that allows the deposition of multilayer structures of up to six different materials.

There are two deposition chambers with a diode substrate heater that allows deposition at temperatures up to 1200°C. Layer-by-layer growth of functional materials, controlled by a kSA 400 RHEED system, is also available in our specialised UHV deposition chamber.